| 摘要 |
<p>Dropping of shoulder portions of a protruding section of an uneven pattern is suppressed as much as possible. A method for forming an uneven pattern is provided with: a step of forming a guide pattern (6) provided with a pattern having a protruding section on base materials (2, 4) whereupon the uneven pattern is to be formed; a step of forming, on the guide pattern, a formed layer having a laminated structure wherein a first layer (8), which contains at least one element selected from among a group composed of a first metal element and metalloid elements, and a second layer (10), which contains a second metal element different from the first metal element, are laminated; a step of selectively leaving the formed layer only on a side portion of the protruding section by etching the formed layer; a step of removing the guide pattern; and a step of forming the uneven pattern on the base material by etching the base material by using the left formed layer as a mask.</p> |
