| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of suppressing occurrence of an exposure failure while suppressing deterioration in the throughput. <P>SOLUTION: The exposure apparatus includes an optical system having an emission surface for emitting exposure light; a first surface arranged on at least a part of a periphery of an optical path of the exposure light emitted from the emission surface; a second surface arranged on at least a part of the periphery of the first surface; a third surface arranged on at least a part of the periphery of the second surface; a first feed slit for feeding first liquid to the second surface, which is arranged to direct outward with respect to radiating directions of an optical axis of the optical system on at least a part of the periphery of the first surface; and a second feed slit for feeding second liquid to the third surface, which is arranged to direct outward with respect to the radiating directions of the optical axis on at least a part of the periphery of the second surface. In at least a part for exposing a substrate, the surface of the substrate faces the emission surface, the first surface, the second surface, and the third surface, while the substrate is exposed with the exposure light from the emission surface via third liquid existing between the emission surface and the surface of the substrate. <P>COPYRIGHT: (C)2011,JPO&INPIT |
