SLIMMING PROCESSING METHOD FOR RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a slimming processing method for a resist pattern which can reduce variation in line width of a resist pattern after slimming processing when the resist pattern formed by exposure processing and development processing is subjected to slimming processing. SOLUTION: The slimming processing method for a resist pattern for performing slimming processing for a resist pattern formed on a substrate comprises a slimming processing process by applying a reacting substance for solubilizing a resist pattern onto the resist pattern, carrying out heat treatment under predetermined heat treatment conditions and executing development processing for resist pattern slimming processing; and a first line width measuring process for measuring the line width of the resist pattern before the slimming processing process. The heat treatment conditions are decided based on measurement values of the line width measured in the first line width measuring process. COPYRIGHT: (C)2011,JPO&INPIT