发明名称 |
ANTIREFLECTIVE HARD MASK COMPOSITIONS |
摘要 |
The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins.
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申请公布号 |
US2010297539(A1) |
申请公布日期 |
2010.11.25 |
申请号 |
US20090582673 |
申请日期 |
2009.10.20 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. |
发明人 |
GRONBECK DANA A.;KWOK AMY M.;TRUONG CHI Q.;GALLAGHER MICHAEL K.;ZAMPINI ANTHONY |
分类号 |
G03F1/00;G03F7/004 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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