发明名称 |
METHODS AND APPARATUS FOR ALIGNING A SET OF PATTERNS ON A SILICON SUBSTRATE |
摘要 |
<p>A method of aligning a set of patterns on a substrate, the substrate including a substrate surface depositing a set of silicon nanoparticles on the substrate surface, the set of nanoparticles including a set of ligand molecules including a set of carbon atoms, wherein a first set of regions is formed where the silicon nanoparticles are deposited and the remaining portions of the substrate surface define a second set of regions The method also includes densifying the set of silicon nanoparticles into a thin film wherein a set of silicon-organic zones are formed on the substrate surface, wherein the first set of regions has a first reflectivity value and the second set of regions has a second reflectivity value The method further includes illuminating the substrate surface with an illumination source, wherein the ratio of the second reflectivity value to the first reflectivity value is greater than about 1.1.</p> |
申请公布号 |
WO2010135309(A1) |
申请公布日期 |
2010.11.25 |
申请号 |
WO2010US35231 |
申请日期 |
2010.05.18 |
申请人 |
INNOVALIGHT, INC.;MEISEL, ANDREAS;BURROWS, MICHAEL;ANTONIADIS, HOMER |
发明人 |
MEISEL, ANDREAS;BURROWS, MICHAEL;ANTONIADIS, HOMER |
分类号 |
H01L21/66;B05C19/00 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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