BLACK MATRIX HIGH SENSITIVE PHOTORESIST COMPOSITION FOR LIQUID CRYSTAL DISPLAY AND BLACK MATRIX PREPARED BY USING THE SAME,申请号KR20060133555-传众专利搜索

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发明名称	BLACK MATRIX HIGH SENSITIVE PHOTORESIST COMPOSITION FOR LIQUID CRYSTAL DISPLAY AND BLACK MATRIX PREPARED BY USING THE SAME
摘要
申请公布号	KR100996591(B1)	申请公布日期	2010.11.25
申请号	KR20060133555	申请日期	2006.12.26
申请人		发明人
分类号	G03F7/028;G03F7/032	主分类号	G03F7/028
代理机构		代理人
主权项
地址

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