| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cleaning device that can suppress occurrence of an exposure defect. <P>SOLUTION: The cleaning device cleans a prescribed member in an exposure device which exposes a substrate to exposure light through a liquid. The cleaning device includes an irradiation device which fuses or vaporizes foreign matter on the prescribed member by irradiating the prescribed member with pulsed light to remove the foreign matter from the prescribed member. <P>COPYRIGHT: (C)2011,JPO&INPIT |
