| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition having a low dielectric constant, high transparency, high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high heat resistance, excellent adhesion to a base, and the like, the composition which is useful for forming a patterned organic film obtained by developing with an alkali aqueous solution. <P>SOLUTION: The positive photosensitive composition includes: a copolymer that includes an acrylate-based or styrene-based radical polymerizable monomer unit of a specified structure including a silicon atom; and a 1,2-quinonediazide compound. <P>COPYRIGHT: (C)2011,JPO&INPIT |
