| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new compound useful as an acid-generating agent for a resist composition, to provide the acid-generating agent comprising the compound, to provide the resist composition containing the acid-generating agent, and to provide a method for forming a resist pattern by using the resist composition. <P>SOLUTION: The resist composition contains (A) a base material component changing the solubility in an alkali developing liquid by the action of an acid, and (B) an acid-generating agent component generating the acid by light exposure. The acid-generating agent component (B) is composed of a sulfonium-based cation part having a fluoroalkyl group, and an anion part constituted of a sulfonic acid salt having a carbonyl group and a fluoroalkylene group, or an imidate compound [with the proviso that the anion part is one of (b2-1) and (b2-2) represented by the general formula] in the resist composition. <P>COPYRIGHT: (C)2011,JPO&INPIT |
