发明名称 METHOD FOR PRODUCING SILICON FINE PARTICLE
摘要 PROBLEM TO BE SOLVED: To obtain a method for producing high purity silicon fine particles in which the diffusion of an impure metal into the silicon fine particles is prevented. SOLUTION: Disclosed is the method for producing the silicon fine particles by crushing a silicon lump 1, in which the silicon lump 1 is crushed in an oxidizing liquid 4, from which oxygen is released to oxidize silicon, thereby the silicon fine particles are produced by crushing the silicon lump 1 while forming a silicon oxide film on the surface of the crushed silicon fine particle. As a result, since the diffusion of impurities in silicon can be prevented when the silicon lump is crushed, the high purity silicon fine particles can be obtained in which the diffusion of the impure metal is prevented. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010265158(A) 申请公布日期 2010.11.25
申请号 JP20090120307 申请日期 2009.05.18
申请人 MITSUBISHI ELECTRIC CORP 发明人 DEO SHINICHI;SAKAI YUICHI;TAYA MASAKI
分类号 C01B33/02 主分类号 C01B33/02
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