发明名称 |
METHOD FOR PRODUCING NITRIDE SINGLE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a nitride single crystal capable of producing the high quality nitride single crystal. SOLUTION: The method for producing the nitride single crystal comprises a step to prepare a heterogeneous substrate 1 and a step to form a nitride single crystal film 3 on the heterogeneous substrate 1. The heterogeneous substrate 1 is made of a material subliming within a temperature range of forming the nitride single crystal film 3. In the step to form the nitride single crystal film 3, the forming of the film starts from a temperature of the subliming temperature of the heterogeneous substrate 1 or lower and then the temperature of the forming of the film is raised to a higher temperature than the subliming temperature of the heterogeneous substrate 1. It is favorable that the nitride single crystal film 3 is denoted as Al<SB>x</SB>Ga<SB>1-x</SB>N and the heterogeneous substrate 1 is SiC. COPYRIGHT: (C)2011,JPO&INPIT
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申请公布号 |
JP2010265132(A) |
申请公布日期 |
2010.11.25 |
申请号 |
JP20090116688 |
申请日期 |
2009.05.13 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
SATO KAZUNARI;YAMAMOTO YOSHIYUKI |
分类号 |
C30B29/38;C23C16/34;C23C16/448;C30B25/10;H01L21/20;H01L21/203 |
主分类号 |
C30B29/38 |
代理机构 |
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