发明名称 |
Coating compositions suitable for use with an overcoated photoresist |
摘要 |
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
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申请公布号 |
US2010297556(A1) |
申请公布日期 |
2010.11.25 |
申请号 |
US20100658614 |
申请日期 |
2010.02.08 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
CAMERON JAMES F.;SUNG JIN WUK;AMARA JOHN P.;PROKOPOWICZ GREGORY P.;VALERI DAVID A. |
分类号 |
G03F7/004;C07D487/08;C08G73/10;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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