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发明名称
METHOD AND APPARATUS FOR POLISHING OUTER CIRCUMFERENTIAL END SECTION OF SEMICONDUCTOR WAFER
摘要
申请公布号
KR20100123682(A)
申请公布日期
2010.11.24
申请号
KR20107016475
申请日期
2009.02.17
申请人
NIHON MICRO COATING CO., LTD.
发明人
YAMAGUCHI NAOHIRO;MATSUMOTO YASUO;KATOH KENJI;HIRAGA TAKASHI
分类号
H01L21/304;B24B9/00;B24B21/00;B24D11/00
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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