发明名称 EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE
摘要 To provide an exposure apparatus that allows an understanding of the condition of the apparatus and that can prevent a leakage or scattering of a liquid. The exposure apparatus (EX) includes a display apparatus (D) that indicates at least one of a status of filling of an optical path space (K1) of the exposure light (EL) with the liquid (LQ) and a status of recovering of the liquid (LQ) from the optical path space (K1).
申请公布号 EP1833081(A4) 申请公布日期 2010.11.24
申请号 EP20050814498 申请日期 2005.12.06
申请人 NIKON CORPORATION 发明人 NAKAGAWA, CHIAKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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