| 摘要 |
PURPOSE: A substrate surface treatment device and a method thereof are provided to reduce a stripe-shaped curve on the surface of a substrate by maximizing the anisotropic etching effect of the curve by using a HF series solution. CONSTITUTION: A glass substrate, in which a plurality of curves are formed, is injected. The glass substrate, in which a surface processing tank(133) is injected through a substrate injection part, is located. The surface processing tank includes a drug solution. A plurality of rollers transfer and return the glass substrates into the surface processing tank.
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