发明名称 |
POLYMER MATERIAL, FOAM OBTAINED FROM SAME, AND POLISHING PAD USING THOSE |
摘要 |
The subject is to provide a polymer material which enables to improve planarity and planarization efficiency of a polished surface and is useful as a polishing pad which generates only a few scratches. The said subject is solved by a polymer material having a tensile modulus at 50°C after saturation swelling with 50°C water of 130 to 800 MPa, a loss tangent at 50°C of not more than 0.2, and a contact angle with water of not more than 80°. |
申请公布号 |
EP1927605(A4) |
申请公布日期 |
2010.11.24 |
申请号 |
EP20060810673 |
申请日期 |
2006.09.21 |
申请人 |
KURARAY CO., LTD. |
发明人 |
OKAMOTO, CHIHIRO;KATO, SHINYA;KANEDA, SHUNJI;KIKUCHI, HIROFUMI |
分类号 |
C08G18/00;B24B37/24;C08J9/12;C08L75/00;H01L21/304 |
主分类号 |
C08G18/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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