发明名称 APPARATUS OF DEMOUNTING PELLICLE AND METHOD FOR CLEANING RETICLE BY USING THE SAME
摘要 <p>PURPOSE: The pellicle desorption equipment and reticle cleaning solution using the same exhibits the pellicle desorption equipment for controlling the residue of adhesive in the desorption of pellicle and reticle cleaning solution using the same. CONSTITUTION: In the reticle(300), the frame in which the pellicle(700) is attached is attached with adhesive to the adhesion domain of the front side. In the housing, reticle is introduced. The heating block(200) offers the radiant heat to the adhesion domain. The ultraviolet ray is examined in the surface of reticle and the surface is hydrophilized.</p>
申请公布号 KR20100122653(A) 申请公布日期 2010.11.23
申请号 KR20090041656 申请日期 2009.05.13
申请人 HYNIX SEMICONDUCTOR INC. 发明人 RYU, JI SUN
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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