发明名称 Structure for on-chip electromigration monitoring system
摘要 A design structure embodied in a machine readable medium used in a design process can include apparatus of a semiconductor chip operable to detect an increase in resistance of a monitored element of the semiconductor chip. The design structure can include, for example, a resistive voltage divider circuit operable to output a plurality of reference voltages having different values. A plurality of comparators in the semiconductor chip may be coupled to receive the reference voltages and a monitored voltage representative of a resistance of the monitored element. Each of the comparators may produce an output indicating whether the monitored voltage exceeds the reference voltages, so that the resistance value of the monitored element may be precisely determined.
申请公布号 US7840916(B2) 申请公布日期 2010.11.23
申请号 US20070985966 申请日期 2007.11.19
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 HSU LOUIS L.;CRANFORD, JR. HAYDEN C.;GLUSCHENKOV OLEG;MASON JAMES S.;SORNA MICHAEL A.;YANG CHIH-CHAO
分类号 G06F17/50 主分类号 G06F17/50
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