发明名称 Fin interconnects for multigate FET circuit blocks
摘要 In an embodiment, an apparatus includes a first field effect transistor including a first source contact region, a first drain contact region and a first plurality of fins overlying a substrate, a first gate overlying the first plurality of fins, the first source contact region coupled to first ends of the first plurality of fins, and a second field effect transistor including a second source contact region, a second drain contact region, and a second plurality of fins overlying the substrate, a second gate overlying the second plurality of fins, and an interconnection contact region overlying the substrate, electrically coupling the first drain contact region and the second source contact region and abutting the first and the second pluralities of fins.
申请公布号 US7838948(B2) 申请公布日期 2010.11.23
申请号 US20070668916 申请日期 2007.01.30
申请人 INFINEON TECHNOLOGIES AG 发明人 GOSSNER HARALD
分类号 H01L27/112 主分类号 H01L27/112
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