发明名称 Methods for making substrates and substrates formed therefrom
摘要 A method for making substrates for use in optics, electronics, or opto-electronics. The method may include transferring a seed layer onto a receiving support and depositing a useful layer onto the seed layer. The thermal expansion coefficient of the receiving support may be identical to or slightly larger than the thermal expansion coefficient of the useful layer and the thermal expansion coefficient of the seed layer may be substantially equal to the thermal expansion coefficient of the receiving support. Preferably, the nucleation layer and the intermediate support have substantially the same chemical composition.
申请公布号 US7839001(B2) 申请公布日期 2010.11.23
申请号 US20090536082 申请日期 2009.08.05
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES 发明人 BOUSSAGOL ALICE;FAURE BRUCE;GHYSELEN BRUNO;LETERTRE FABRICE;RAYSSAC OLIVIER
分类号 H01L23/52;H01L21/30;H01L21/46;H01L21/762;H01L23/48 主分类号 H01L23/52
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