发明名称 |
A PROTECTIVE COATING FOR A PLASMA PROCESSING CHAMBER PART AND A METHOD OF USE |
摘要 |
A flexible polymer or elastomer coated RF return strap to be used in a plasma chamber to protect the RF strap from plasma generated radicals such as fluorine and oxygen radicals, and a method of processing a semiconductor substrate with reduced particle contamination in a plasma processing apparatus. The coated RF strap minimizes particle generation and exhibits lower erosion rates than an uncoated base component. Such a coated member having a flexible coating on a conductive flexible base component provides an RF ground return configured to allow movement of one or more electrodes in an adjustable gap capacitively coupled plasma reactor chamber. |
申请公布号 |
KR20100122901(A) |
申请公布日期 |
2010.11.23 |
申请号 |
KR20107017612 |
申请日期 |
2009.02.06 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
KADKHODAYAN BOBBY;MCCHESNEY JON;PAPE ERIC;DHINDSA RAJINDER |
分类号 |
H01L21/3065;H01L21/203;H01L21/205;H01L21/265 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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