发明名称 Method of manufacturing semiconductor device
摘要 A semiconductor substrate in a wafer state having one surface provided thereon a plurality of external connection electrodes is stacked onto a support film. The wafer-state semiconductor substrate stuck on the support film is cut into a plurality of chip size semiconductor substrates, whereby the adjacent semiconductor substrates are separated from each other, and each semiconductor substrate is provided with at least one of the external connection electrodes. At least one protection film is formed on the other surface of the chip size semiconductor substrates, and on a peripheral side surface thereof that the chip size semiconductor substrates, which are adjacent to each other, are separated from each other.
申请公布号 US7838394(B2) 申请公布日期 2010.11.23
申请号 US20070706772 申请日期 2007.02.15
申请人 CASIO COMPUTER CO., LTD. 发明人 KANEKO NORIHIKO
分类号 H01L21/00 主分类号 H01L21/00
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