发明名称 |
Exhaust system and exhausting pump connected to a processing chamber of a substrate processing apparatus |
摘要 |
An exhausting system and an exhausting pump connected to a processing chamber of a substrate processing apparatus are provided. The exhausting pump is provided with at least one rotary blade and a cylindrical intake part disposed at the processing chamber side from the rotary blade. The exhausting pump includes a reflecting device disposed inside the intake part and having at least one reflecting surface oriented to the rotary blade. |
申请公布号 |
US7837432(B2) |
申请公布日期 |
2010.11.23 |
申请号 |
US20080347349 |
申请日期 |
2008.12.31 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MORIYA TSUYOSHI;MURAKAMI TAKAHIRO;KOBAYASHI YOSHIYUKI;SATO TETSUJI |
分类号 |
F01D1/36 |
主分类号 |
F01D1/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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