发明名称 Non-volatile memory device and method of manufacturing the same
摘要 In a phase change memory, electric property of a diode used as a selection device is extremely important. However, since crystal grain boundaries are present in the film of a diode using polysilicon, it involves a problem that the off leak property varies greatly making it difficult to prevent erroneous reading. For overcoming the problem, the present invention provides a method of controlling the temperature profile of an amorphous silicon in the laser annealing for crystallizing and activating the amorphous silicon thereby controlling the crystal grain boundaries. According to the invention, variation in the electric property of the diode can be decreased and the yield of the phase-change memory can be improved.
申请公布号 US7838379(B2) 申请公布日期 2010.11.23
申请号 US20090362277 申请日期 2009.01.29
申请人 HITACHI, LTD. 发明人 KINOSHITA MASAHARU;TERAO MOTOYASU;MATSUOKA HIDEYUKI;SASAGO YOSHITAKA;KIMURA YOSHINOBU;SHIMA AKIO;TAI MITSUHARU;TAKAURA NORIKATSU
分类号 H01L21/20 主分类号 H01L21/20
代理机构 代理人
主权项
地址