发明名称 |
Mask blank, method of manufacturing an exposure mask, and method of manufacturing an imprint template |
摘要 |
A mask blank includes a substrate and a thin film formed thereon and used to form a pattern. The mask blank is adapted to be subjected to dry etching corresponding to a method of producing an exposure mask by patterning the thin film by dry etching using an etching gas substantially free from oxygen with a resist pattern formed on the thin film used as a mask. The thin film has a protective layer formed at least at its upper layer and containing 60 atomic % or more oxygen. For example, the dry etching is performed by the use of a chlorine-based gas substantially free from oxygen.
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申请公布号 |
US7838180(B2) |
申请公布日期 |
2010.11.23 |
申请号 |
US20080038826 |
申请日期 |
2008.02.28 |
申请人 |
HOYA CORPORATION |
发明人 |
NOZAWA OSAMU;KUREISHI MITSUHIRO |
分类号 |
G03F1/50;G03F1/54;G03F1/68 |
主分类号 |
G03F1/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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