| 摘要 |
A manufacturing method of a liquid crystal display device is provided. The method includes forming a gate line and a data line on a substrate; forming a thin film transistor connected to the gate and data lines, the thin film transistor including a gate electrode, a semiconductor layer, a source electrode and a drain electrode; forming a black matrix over the thin film transistor, the black matrix having an opening; forming a first conductive layer on a substrate having the black matrix such that the first conductive layer contacts a portion of the drain electrode; forming a color filter layer on the first conductive layer at a portion corresponding to the opening of the black matrix; partially etching a surface of the first conductive layer corresponding to the black matrix; forming a second conductive layer on the color filter layer such that the second conductive layer contacts the partially etched first conductive layer; and forming a pixel electrode by patterning the first and second conductive layers. |
