发明名称 |
ENHANCED ELECTROMIGRATION PERFORMANCE OF COPPER LINES IN METALLIZATION SYSTEMS OF SEMICONDUCTOR DEVICES BY SURFACE ALLOYING |
摘要 |
<p>In sophisticated semiconductor devices, the electromigration performance of copper metal lines at the top interface thereof may be enhanced by forming a copper alloy (132C) that is locally restricted to the interface (132S). To this end, an appropriate alloy-forming species, such as aluminum, may be provided on the basis of a non-masked deposition process and may be subsequently removed by a non-masked etch process, wherein the characteristic of the resulting alloy may be adjusted during an intermediate heat treatment.</p> |
申请公布号 |
WO2010132277(A1) |
申请公布日期 |
2010.11.18 |
申请号 |
WO2010US33948 |
申请日期 |
2010.05.07 |
申请人 |
GLOBALFOUNDRIES INC.;FEUSTEL, FRANK;LETZ, TOBIAS;PREUSSE, AXEL |
发明人 |
FEUSTEL, FRANK;LETZ, TOBIAS;PREUSSE, AXEL |
分类号 |
H01L23/532;H01L21/768 |
主分类号 |
H01L23/532 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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