| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To reduce capacitance in a crossing region of electrode wiring. <P>SOLUTION: The electron beam device 11 includes a substrate 1, a first electrode wiring 2 formed on the substrate 1, an insulating layer 4 to cover the first electrode wiring 2, a second electrode wiring 3 formed on the insulating layer 4 by crossing with the first electrode wiring 2, and an electron emitting element 6 which is positioned in a region 10 separated from an electrode wiring crossing region 9 where the first electrode wiring 2 and the second electrode wiring 3 on the substrate 1 are crossed, which is connected to both of the first electrode wiring 2 and the second electrode wiring 3, and in which driving energy is received from the first electrode wiring 2 and the second electrode wiring 3. At least in a part of the electrode wiring crossing region 9, a gap 5 is formed between the first electrode wiring 2 and the second electrode wiring 3. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
