| 发明名称 |
METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL |
| 摘要 |
Disclosed is a method for producing a TiO2-SiO2 glass body, which comprises a step in which a TiO2-SiO2 glass body after transparent vitrification is maintained within a temperature range from T1-90 (°C) to T1-220 (°C) for 120 hours or more, with T1 (°C) being the annealing point of the TiO2-SiO2 glass body after transparent vitrification. |
| 申请公布号 |
WO2010131662(A1) |
申请公布日期 |
2010.11.18 |
| 申请号 |
WO2010JP57977 |
申请日期 |
2010.05.11 |
| 申请人 |
ASAHI GLASS COMPANY, LIMITED.;KOIKE AKIO;MITSUMORI TAKAHIRO;IWAHASHI YASUTOMI;OGAWA TOMONORI |
发明人 |
KOIKE AKIO;MITSUMORI TAKAHIRO;IWAHASHI YASUTOMI;OGAWA TOMONORI |
| 分类号 |
C03B32/00;C03B20/00;C03B25/00;C03C3/06;C03C3/076;G03F1/24;H01L21/027 |
主分类号 |
C03B32/00 |
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