| 摘要 |
<p>An exposure apparatus comprises: an optical system (PL), which has an emergent surface (11) wherefrom exposure light emerges; a first surface (21), which is disposed at least partly around an optical path of the exposure light from the emergent surface; a second surface (22), which is disposed at least partly around the first surface; a third surface (23), which is disposed at least partly around the second surface; a first supply port (73), which is disposed at least partly around the first surface (21) such that the first supply port is directed in an outward radial direction with respect to an optical axis of the optical system, that supplies a first liquid (Ql) to the second surface (22); and a second supply port (83), which is disposed at least partly around the second surface (22) such that the second supply port (83) is directed in an outward radial direction with respect to the optical axis, that supplies a second liquid (Q2) to the third surface. During at least part of an exposure of the substrate, a front surface of the substrate opposes (P) the emergent surface (11), the first surface (21), the second surface (22), and the third surface (23); and the substrate is exposed with the exposure light that emerges from the emergent surface (11) and transits a third liquid (Q3) between the emergent surface and the front surface of the substrate.</p> |
