| 发明名称 |
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING THE RESIST COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide: a resist composition having excellent application properties to a support; a method for forming a resist pattern; and a method for producing the resist composition. <P>SOLUTION: The resist composition is prepared by dissolving a base component (A) whose solubility with an alkali developing solution changes by the action of an acid and an acid generator component (B) generating an acid by exposure into an organic solvent (S). The organic solvent (S) contains 1-butoxy-2-propanol and 2-butoxy-1-propanol excluding a solvent prepared by mixing 1-butoxy-2-propanol and 2-butoxy-1-propanol, in which the proportion of the 2-butoxy-1-propnaol is ≥1.5 parts by mass based on 100 parts by mass of the 1-butoxy-2-propanol. <P>COPYRIGHT: (C)2011,JPO&INPIT |
| 申请公布号 |
JP2010262073(A) |
申请公布日期 |
2010.11.18 |
| 申请号 |
JP20090111456 |
申请日期 |
2009.04.30 |
| 申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
SAITO HIROKUNI;TAKESHITA MASARU;YOSHII YASUHIRO;YOKOYA JIRO;NAKAMURA TAKESHI;WATANABE TSUNEHIRO |
| 分类号 |
G03F7/004;C08F220/10;G03F7/039;G03F7/40;H01L21/027 |
主分类号 |
G03F7/004 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
