发明名称 |
RESIN COMPOSITION FOR FORMATION OF PATTERN, PATTERN FORMATION METHOD, AND PROCESS FOR PRODUCTION OF LIGHT-EMITTING ELEMENT |
摘要 |
<p>Disclosed are: a resin composition for forming a pattern, which enables the formation of a pattern stably at a level of the wavelength of light; a method for forming a pattern having a sea-island structure using the composition; and a method for producing a light-emitting element that can achieve high luminous efficiency properties. The resin composition for forming a pattern comprises: (a) a specific block copolymer containing an aromatic ring-containing polymer and a poly(meth)acrylate as block moieties; (b) a homopolymer of a specific aromatic ring-containing polymer; and (c) a homopolymer of a specific poly(meth)acrylate, wherein the ratio of the total amount of the aromatic ring-containing homopolymer (b) and the poly(meth)acrylate homopolymer (c) relative to the total amount of the resin composition is 0 to 90% by mass, and the total amount of an aromatic ring-containing polymer moiety that is contained in the block copolymer (a) as a block moiety and the aromatic ring-containing homopolymer (b) relative to the total amount of the resin composition is 10 to 60% by mass.</p> |
申请公布号 |
WO2010131680(A1) |
申请公布日期 |
2010.11.18 |
申请号 |
WO2010JP58050 |
申请日期 |
2010.05.12 |
申请人 |
KABUSHIKI KAISHA TOSHIBA;ASAHI KASEI E-MATERIALS CORPORATION;ASAKAWA KOUJI;KITAGAWA RYOUTA;FUJIMOTO AKIRA;SHIRAE YOSHIAKI;YORISUE TOMOHIRO;IKEDA AKIHIKO |
发明人 |
ASAKAWA KOUJI;KITAGAWA RYOUTA;FUJIMOTO AKIRA;SHIRAE YOSHIAKI;YORISUE TOMOHIRO;IKEDA AKIHIKO |
分类号 |
H01L21/312;C08F297/00;C08L25/02;C08L33/06;C08L53/00;H01L21/3065;H01L33/22 |
主分类号 |
H01L21/312 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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