| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a laser exposure device for achieving higher definition exposure by converting a semiconductor laser into a light source more suitable for high definition exposure. <P>SOLUTION: In the laser exposure device in which a surface to be exposed of a substrate 11 is irradiated with laser light emitted from a laser light source 1, intensity-modulated with a modulator 3, and condensed via optical systems 9, 10a, and the substrate is transferred by a substrate transfer device 61, a divergence angle of the laser light is adjusted by a divergence angle adjusting optical system 2, 202 having at least two or more pairs of divergence angle adjusting lenses 203, 204 respectively constructed with two cylindrical lenses which are placed in a direction perpendicular to the laser optical path, of which the cylindrical axes are in the same direction and of which the distance between them is variable. <P>COPYRIGHT: (C)2011,JPO&INPIT |
