发明名称 VAPOR DEPOSITION METHOD AND VAPOR DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To enable a dense pattern to be formed by enhancing the accuracy of a vapor-depositing position in a vapor deposition process of vapor-depositing a material on a substrate which is being transported. SOLUTION: This vapor deposition method includes: taking an image of an alignment mark which is formed in a vapor deposition mask 16B and a pixel which is previously formed on the surface of the substrate 9 for an organic EL display, with an imaging means 4 that is arranged so as to take an image of a position which is located in a front side of positions to be vapor-deposited through vapor deposition masks 16R, 16G and 16B, in a transportation direction of the substrate; detecting an amount of the deviation of a reference position of the alignment mark from a reference position of the pixel, based on the imaged picture; and forming a predetermined pattern on the pixel of the substrate 9 for the organic EL display by vapor deposition, which is being transported, while aligning the vapor deposition masks 16R, 16G and 16B by moving the vapor deposition masks in an approximately orthogonal direction to the transporting direction in a plane parallel to the substrate plane with an alignment means 5 so that the amount of the deviation becomes a predetermined value. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010261081(A) 申请公布日期 2010.11.18
申请号 JP20090113519 申请日期 2009.05.08
申请人 V TECHNOLOGY CO LTD 发明人 KAJIYAMA KOICHI;MIZUMURA MICHINOBU;HASHIMOTO KAZUE
分类号 C23C14/04;H01L51/50;H05B33/10 主分类号 C23C14/04
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