发明名称 |
Method for forming lens, method for manufacturing semiconductor apparatus, and electronic information device |
摘要 |
A lens forming method according to the present invention for forming lenses capable of focusing light on a plurality of respective photoelectric conversion sections constituting of a semiconductor apparatus is described. The method includes a lens forming step of processing a lens forming material, in which an average gradient of aγcurve indicating a residual film thickness with respect to the amount of irradiation light is between−15 and−0.8 nm·cm2/mJ within the range of a residual film ratio of 10 to 50% or within the range of the amount of irradiation light of 55 to 137 mJ/cm2 into a lens surface shape, using a photomask with an optical transmittance that is varied according to a lens surface shape, as an exposure mask.
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申请公布号 |
US2010289034(A1) |
申请公布日期 |
2010.11.18 |
申请号 |
US20100799994 |
申请日期 |
2010.05.05 |
申请人 |
SHARP KABUSHIKI KAISHA |
发明人 |
NAKAI JUNICHI |
分类号 |
H01L27/146;G02B3/00;G03F7/20;H01L21/8234;H01L27/14;H01L27/148;H01L27/15;H01L31/0232;H01L33/58;H04N5/335;H04N5/369 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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