摘要 |
A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), <CHEM> wherein R<1> represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X<1> represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R<2> represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield. |
申请人 |
JSR CORP.;INTERNATIONAL BUSINESS MACHINES CORP. |
发明人 |
NISHIMURA, YUKIO;YAMAHARA, NOBORU;YAMAMOTO, MASAFUMI;KAJITA, TORU;SHIMOKAWA, TSUTOMU;ITO, HIROSHI |