发明名称 SILICON CARBIDE SUBSTRATE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SILICON CARBIDE SUBSTRATE
摘要 A silicon carbide substrate (1) with which manufacturing cost of a semiconductor device using the silicon carbide substrate can be reduced is provided with: a base substrate (10) composed of a silicon carbide; and a SiC layer (20), which is composed of single crystal silicon carbide other than the silicon carbide of the base substrate (10) and is disposed on the base substrate (10) in contact with the base substrate. Thus, in the silicon carbide substrate (1), the silicon carbide single crystal can be effectively used.
申请公布号 CA2761428(A1) 申请公布日期 2010.11.18
申请号 CA20102761428 申请日期 2010.04.27
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 NISHIGUCHI, TARO;SASAKI, MAKOTO;HARADA, SHIN;FUJIWARA, SHINSUKE;NAMIKAWA, YASUO
分类号 H01L21/02;C30B29/36;H01L21/20;H01L21/336;H01L29/12;H01L29/78 主分类号 H01L21/02
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