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发明名称
Ätzverfahren zur Herstellung einer Halbleitervorrichtung mit einer unteren Kondensatorelektrode
摘要
申请公布号
DE102004045492(B4)
申请公布日期
2010.11.18
申请号
DE200410045492
申请日期
2004.09.20
申请人
SAMSUNG ELECTRONICS CO. LTD.
发明人
LEE, WON-JUN;HWANG, IN-SEAK;KO, YONG-SUN;YOON, BYOUNG-MOON
分类号
H01L21/306;H01L21/8242;H01L21/02;H01L21/311;H01L27/108
主分类号
H01L21/306
代理机构
代理人
主权项
地址
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