| 摘要 |
A plasma enhanced chemical vapor deposition (PECVD) apparatus for coating an interior surface of a vessel (80) is provided, the apparatus comprising a vessel holder (50) comprising a vessel port (42) configured to receive and seat a first opening of the vessel for processing the interior surface of the seated vessel via the vessel port, an inner electrode (108) for being arranged within an interior space of the seated vessel, an outer electrode (160) having an interior portion for receiving the seated vessel, and a power supply (162) to create a plasma within the vessel, wherein the seated vessel and vessel holder are adapted for defining a plasma reaction chamber. |
