发明名称 FABRICATION METHOD OF NANOPORE WITH BUILT-IN NANO-SCALE GATE PROBE
摘要 PURPOSE: A manufacturing method of a nanopore embed with a nano-scale gate probe is provided to grasp the location and the arrangement of deoxyribo nucleic acid by analyzing the base sequence after fixing the probe. CONSTITUTION: A manufacturing method of a nanopore embed with a nano-scale gate probe comprises the following steps: inserting a thin conductive film(CL1) in between two parallel dielectric layers(DL2,DL3), capable of reacting with one deoxyribo nucleic acid; and forming a hole capable of passing through only the deoxyribo nucleic acid.
申请公布号 KR20100121303(A) 申请公布日期 2010.11.17
申请号 KR20090040391 申请日期 2009.05.08
申请人 NANOCHIPS INC. 发明人 CHOI, JUNG BUM;LEE, JONG JIN;YOUN, TAEK KYU
分类号 B82B3/00 主分类号 B82B3/00
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