发明名称 RADIATION-SENSITIVE RESIN COMPOSITION FOR FORMING SPACER, SPACER, METHOD FOR FORMING SPACER AND LIQUID CRYSTAL DISPLAY ELEMENT
摘要 PURPOSE: A photosensitive resin composition is provided to ensure high sensitivity and adhesion after forming a spacer. CONSTITUTION: A photosensitive resin composition for forming a spacer comprises: a resin having an acidic group; a polymerizably unsaturated compound and an oxime ester compound of formula 1. A method for preparing the spacer comprises: a step of forming a photosensitive resin layer on a substrate using the photosensitive resin composition; a step of exposing light to at least a part of photosensitive resin layer; a step of developing the photosensitive layer; and a step of heating the photosentisive resin layer.
申请公布号 KR20100121421(A) 申请公布日期 2010.11.17
申请号 KR20100041925 申请日期 2010.05.04
申请人 FUJIFILM CORPORATION 发明人 KASHIWAGI DAISUKE;YAMAZAKI KENTA;TSUCHIMURA TOMOTAKA;ANDO TAKESHI
分类号 G03F7/027 主分类号 G03F7/027
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