发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION FOR FORMING SPACER, SPACER, METHOD FOR FORMING SPACER AND LIQUID CRYSTAL DISPLAY ELEMENT |
摘要 |
PURPOSE: A photosensitive resin composition is provided to ensure high sensitivity and adhesion after forming a spacer. CONSTITUTION: A photosensitive resin composition for forming a spacer comprises: a resin having an acidic group; a polymerizably unsaturated compound and an oxime ester compound of formula 1. A method for preparing the spacer comprises: a step of forming a photosensitive resin layer on a substrate using the photosensitive resin composition; a step of exposing light to at least a part of photosensitive resin layer; a step of developing the photosensitive layer; and a step of heating the photosentisive resin layer. |
申请公布号 |
KR20100121421(A) |
申请公布日期 |
2010.11.17 |
申请号 |
KR20100041925 |
申请日期 |
2010.05.04 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KASHIWAGI DAISUKE;YAMAZAKI KENTA;TSUCHIMURA TOMOTAKA;ANDO TAKESHI |
分类号 |
G03F7/027 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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