首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
METHOD AND SYSTEM FOR CONTEXT-SPECIFIC MASK WRITING
摘要
A method for generating lithography marks includes generating integrated circuit design data and using context information from the integrated circuit design data to write a mask.
申请公布号
EP1543451(A4)
申请公布日期
2010.11.17
申请号
EP20030764634
申请日期
2003.07.14
申请人
CADENCE DESIGN SYSTEMS, INC.
发明人
PACK, ROBERT, C.;SHEFFER, LOUIS, K.
分类号
G03F;G03F1/00;G03F1/36;G03F1/78;G03F7/20;G03F9/00;G06F17/50;H01L21/027
主分类号
G03F
代理机构
代理人
主权项
地址
您可能感兴趣的专利
ROTOR OF ELECTRIC MOTOR
DEVICE FOR M-SEQUENCE SYNCHRONIZATION
DEVICE FOR BRAKING INDUCTION MOTOR
ELECTRIC MOTOR
ELECTRIC DOOR SWITCH
VARIABLE-RATIO TRANSFORMER
MULTIFUNCTIONAL REGISTER
DEVICE FOR TESTING MAGNETIC DISKS FOR WEAR RESISTANCE
INTEGRATING DEVICE
PIECEWISE LINEAR APPROXIMATING DEVICE
QUERY SERVICING PROCESS SIMULATOR
DEVICE FOR INTERFACING A COMPUTER TO A STEREO TAPE RECORDER
DEVICE FOR SIMULATING SERVICING OF QUERIES OF DIFFERENT PRIORITY
DEVICE FOR SQUARE ROOT EXTRACTION FROM THE SUM OF THREE SQUARED NUMBERS
PUSHBUTTON SWITCH
Remote control transmitter.
HOLLOW PLASTIC PACKAGE FOR SEMICONDUCTOR DEVICES
BEARINGS
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE HAVING IMPROVED INPUT/OUTPUT INTERFACE CIRCUIT
BALLOON FOR CATHETER