发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PURPOSE: A semiconductor device and a manufacturing method thereof are provided to reduce the size of a device and implement high integration by reducing the width of a guide ring below the minimal width corresponding to a marginal aspect ratio. CONSTITUTION: A substrate(100) comprises a plurality of conductive structures and a wiring line. An interlayer insulation layer includes a fuse window(135). A fuse line(125) is electrically connected to the wiring line. A guard ring(180) prevent the entry of foreign materials and includes a protrusion member(150) separated from the body with a constant distance.
申请公布号 KR20100120484(A) 申请公布日期 2010.11.16
申请号 KR20090039319 申请日期 2009.05.06
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, SEONG HO;KIM, GIL SUB;YANG, DONG KWAN
分类号 H01L23/62;H01L21/82 主分类号 H01L23/62
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