| 发明名称 |
Photoacid generators and lithographic resists comprising the same |
| 摘要 |
The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications. In one embodiment, the present invention provides a photoacid generator of Formula (I):
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| 申请公布号 |
US7833690(B2) |
申请公布日期 |
2010.11.16 |
| 申请号 |
US20060544463 |
申请日期 |
2006.10.06 |
| 申请人 |
THE UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE |
发明人 |
GONSALVES KENNETH E.;WANG MINGXING |
| 分类号 |
G03C1/73;G03F7/004;G03F7/029 |
主分类号 |
G03C1/73 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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