| 摘要 |
An exposure apparatus for exposing a substrate to light. A substrate stage holds and moves the substrate, a scope measures a predetermined mark to align the substrate, and a controller controls the position of the substrate stage and the operation of the scope, thereby executing a first measurement and a second measurement necessary for a single calibration of the apparatus to align the substrate. The controller executes the first measurement and the second measurement at frequencies different from each other.
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