发明名称 DOWNWARD NOZZLE TYPE EFFUSION CELL AND DOWNWARD NOZZLE TYPE VACUUM PLATING DEVICE USING THE SAME
摘要 PURPOSE: A downward nozzle type effusion cell and a downward nozzle type vacuum deposition device using the same are provided to enable top-down vacuum deposition by guiding the source material, which is evaporated from a crucible of a downward nozzle type vacuum deposition device, downward. CONSTITUTION: A downward nozzle type effusion cell(10) comprises a source crucible(12), a thermal radiation/source reflector(13), a heating element(14), a source crucible supporting unit(15), and a housing(19). The source crucible stores a source material and has a top opening. The thermal radiation/source reflector is arranged outside the source crucible in order to surround the opening of the source crucible. The heating element is arranged along the circumference of the thermal radiation/source reflector and heats the thermal radiation/source reflector. The source crucible supporting unit has one or more openings and supports the lower part of the source crucible. The housing is formed outside the heating element and accepts the source crucible, the thermal radiation/source reflector, the heating element, and the source crucible supporting unit. The thermal radiation/source reflector heated by the heating element emits heat radiation to the source crucible in order to heat the source crucible and the source material in the source crucible. The source material discharged from the heated source crucible is re-heated to be reflected and re-evaporated, and then discharged outside through the opening of the source crucible supporting unit.
申请公布号 KR20100120420(A) 申请公布日期 2010.11.16
申请号 KR20090039222 申请日期 2009.05.06
申请人 ALPHA PLUS CO., LTD 发明人 HWANG, DO WEON;PARK, HEE CHUL;KIM, EUN DO
分类号 C23C14/26 主分类号 C23C14/26
代理机构 代理人
主权项
地址