发明名称 Methods for forming multiple-layer electrode structures for silicon photovoltaic cells
摘要 Methods for forming a photovoltaic cell electrode structure, wherein the photovoltaic cell includes a semiconductor substrate having a passivation layer thereon, includes providing a plurality of contact openings through the passivation layer to the semiconductor substrate, selectively plating a contact metal into the plurality of contact openings to deposit the contact metal, depositing a metal containing material on the deposited contact metal, and firing the deposited contact metal and the deposited metal containing material. The metal containing material may include a paste containing a silver or silver alloy along with a glass frit and is substantially free to completely free of lead. The methods may also use light activation of the passivation layer or use seed layers to assist in the plating.
申请公布号 US7833808(B2) 申请公布日期 2010.11.16
申请号 US20080054034 申请日期 2008.03.24
申请人 PALO ALTO RESEARCH CENTER INCORPORATED 发明人 XU BAOMIN;LITTAU KARL A.;FORK DAVID K.
分类号 H01L21/00;H01L31/00 主分类号 H01L21/00
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