发明名称 |
Liquid material vaporization apparatus for semiconductor processing apparatus |
摘要 |
A liquid material vaporization apparatus for a semiconductor processing apparatus includes: a vaporization tank; an inner partition wall disposed in the tank for dividing the interior of the tank into a charging compartment and a vaporization compartment which are liquid-communicatable with each other over an upper edge of the inner partition wall. A liquid material charged in the charging compartment overflows over the upper edge of the inner partition wall toward the vaporization compartment to store and vaporize the liquid material in the vaporization compartment.
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申请公布号 |
US7833353(B2) |
申请公布日期 |
2010.11.16 |
申请号 |
US20070626777 |
申请日期 |
2007.01.24 |
申请人 |
ASM JAPAN K.K. |
发明人 |
FURUKAWAHARA KAZUNORI;FUKUDA HIDEAKI |
分类号 |
C23C16/455;B01D1/14 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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