| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.
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| 申请公布号 |
US7834974(B2) |
申请公布日期 |
2010.11.16 |
| 申请号 |
US20050167552 |
申请日期 |
2005.06.28 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KEMPER NICOLAAS RUDOLF;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;TEN KATE NICOLAAS;SHULEPOV SERGEI |
| 分类号 |
G03B27/52;G03B27/42 |
主分类号 |
G03B27/52 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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