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发明名称
MULTI-LAYER THICK METALLIZATION STRUCTURE FOR A MICROELECTRONIC DEVICE, INTEGRATED CIRCUIT CONTAINING SAME, AND METHOD OF MANUFACTURING AN INTEGRATED CIRCUIT CONTAINING SAME
摘要
申请公布号
KR20100120224(A)
申请公布日期
2010.11.12
申请号
KR20107021330
申请日期
2009.06.08
申请人
INTEL CORPORATION
发明人
LEE KEVIN J.
分类号
H01L21/3205;H01L21/28
主分类号
H01L21/3205
代理机构
代理人
主权项
地址
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